The 67th JSAP Spring Meeting 2020

Presentation information

Oral presentation

Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[13p-D419-1~16] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Fri. Mar 13, 2020 1:45 PM - 6:15 PM D419 (11-419)

Takashi Yasuda(Ishinomaki Senshu Univ.), Takumi Ikenoue(Kyoto Univ.)

5:45 PM - 6:00 PM

[13p-D419-15] High Temperature Operation of Normally-off β-Ga2O3 MOSFET

Yuuki Uchida1, Tadashi Kase1, Kazuo Aoki1, Shigenobu Yamakoshi1, Kohei Sasaki1, Akito Kuramata1 (1.NCT)

Keywords:beta-Ga2O3, MOSFET, Normally-off

β-Ga2O3 has wide bandgap of 4.5eV. Near future, it is expected that β-Ga2O3 will be candidate of semiconductor devices with high temperatures operation of 250℃ or higher which is difficult by Si. This time, we will show normally-off β-Ga2O3 MOSFET with high temperature operation.