The 67th JSAP Spring Meeting 2020

Presentation information

Print

Oral presentation

Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[13p-D419-1~16] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Fri. Mar 13, 2020 1:45 PM - 6:15 PM D419 (11-419)

Takashi Yasuda(Ishinomaki Senshu Univ.), Takumi Ikenoue(Kyoto Univ.)

3:30 PM - 3:45 PM

▲ [13p-D419-7] Epitaxial growth of bismuth oxyhalides thin films with mist CVD at atmospheric pressure

〇(DC)Zaichun Sun1, Daichi Oka1, Tomoteru Fukumura1,2 (1.Dept. Chem., Tohoku Univ., 2.AIMR and Core Research Cluster, Tohoku Univ.)

Keywords:Mist CVD, Bismuth Oxyhalides, Epitaxial thin film