[14a-A305-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[14a-A305-1] Development of CMOS-MEMS Cointegrated Pressure Sensor Using Minimal-Fab Process

〇Yongxun Liu¹, Ippei Akita¹, Takashi Matsukawa¹, Hiroyuki Tanaka^1,2, Kazuhiro Koga², Kazumasa Nemoto¹, Sommawan Khumpuang^1,2, Masayoshi Nagao¹, Yukinori Morita¹, Shiro Hara^1,2 (1.AIST, 2.MINIMAL)

Keywords:Minimal-fab