[14a-D419-1~12] 6.1 Ferroelectric thin films

△ [14a-D419-6] Effect of deposition condition on the ferroelectric properties of (Al_1-xSc_x)N thin films.

〇(M1)Shinnosuke Yasuoka¹, Takao Shimizu^1,2, Masato Uehara³, Hiroshi Funakubo¹ (1.Tokyo tech, 2.NIMS, 3.AIST)

Keywords:ferroelectric, thin film, nitride

(Al_1-xSc_x)N, which is a solid solution of Sc of Group Ⅲ element in AlN, was reported to have ferroelectricity in 2019. Its properties are good and are attracting attention. In this study, an ultra-thin film of (Al_1-xSc_x)N was prepared by a dual source reactive RF magnetron sputtering. Deposition films were evaluated for crystal structure and ferroelectric properties.