The 67th JSAP Spring Meeting 2020

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[15a-A305-1~13] 13.3 Insulator technology

Sun. Mar 15, 2020 9:00 AM - 12:30 PM A305 (6-305)

Takanobu Watanabe(Waseda Univ.), Koji Kita(Univ. of Tokyo)

9:30 AM - 9:45 AM

[15a-A305-3] The influence of low temperature oxidation process on electrical stress tolerance of SiO2

〇Kosuke Yasuda1, Yan Wu1, Yoshihiro Takahashi1 (1.Nihon Univ.)

Keywords:Low tempetature oxidation process, Time-Dependent Dielectric Breakdown, SiO2 films