The 67th JSAP Spring Meeting 2020

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15 Crystal Engineering » 15.7 Crystal characterization, impurities and crystal defects

[15a-D411-1~11] 15.7 Crystal characterization, impurities and crystal defects

Sun. Mar 15, 2020 9:00 AM - 12:00 PM D411 (11-411)

Hiroaki Kariyazaki(GWJ), Toshinori Taishi(Shinshu Univ.), Takuo Sasaki(QST)

11:00 AM - 11:15 AM

[15a-D411-8] Diffusion of boron in silicon under internal stress field

〇Katsuto Tanahashi1, Koji Sueoka2, Hidetaka Takato1 (1.AIST, 2.Okayama Pref. Univ.)

Keywords:silicon, diffusion, stress