Fabrication and characterization of In2O3 transparent conductive films co-sputtered with CaF2

Kaito Oe; Shinya Aikawa

Presentation information

Poster presentation

Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[15a-PA5-1~25] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Sun. Mar 15, 2020 9:30 AM - 11:30 AM PA5 (PA)

9:30 AM - 11:30 AM

[15a-PA5-8] Fabrication and characterization of In₂O₃transparent conductive films co-sputtered with CaF₂

〇(B)Kaito Oe¹, Shinya Aikawa¹ (1.Kogakuin Univ.)

Keywords:In2O3 transparent conductive films, CaF2

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Presentation information

[15a-PA5-1~25] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[15a-PA5-8] Fabrication and characterization of In2O3 transparent conductive films co-sputtered with CaF2

[15a-PA5-8] Fabrication and characterization of In₂O₃transparent conductive films co-sputtered with CaF₂