[15a-PB2-1~22] 8 Plasma Electronics

[15a-PB2-2] Development of a component analysis method for modulated pulsed power magnetron sputtering by use of a reflectron time-of-flight mass spectrometer

〇Yuki Nakagomi¹, Mutsuki Hirayama¹, Tatsuya Watabe¹, Ryosuke Kaneyuki¹, Nobuo Nishimiya¹, Masaomi Sanekata¹, Hiroaki Yamamoto², Masahide Tona², Keizo Tsukamoto², Keijiro Ohshimo³, Fuminori Misaizu³ (1.Tokyo Polytechinic Univ., 2.Ayabo Corp, 3.Tohoku Univ.)

Keywords:magnetron sputtering, plasma diagnostics, optical measurement

In film formation using modulated pulsed power magnetron sputtering (MPPMS), the ion-to-neutral ratio (Ri/n) is an important index. For the purpose of establishing a plasma diagnostic method to get Ri/n, we introduced a time-of-flight mass spectrometry (TOFMS) as a component analysis for the deposition region in addition to the already installed emission spectroscopy (OES) as a component analysis for the plasma region. Based on the result of those component analyses, the processes from generation to deposition for sputtered particles were investigated.