[15a-PB2-1~22] 8 Plasma Electronics

[15a-PB2-21] Analysis of Temporal Variation in Wafer Temperature Distribution during Plasma Etching Processing

〇Takayoshi Tsutsumi¹, Kenji Ishikawa¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:wafer tempearture, plasma processing