The 67th JSAP Spring Meeting 2020

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[15p-D215-1~11] 7.3 Micro/Nano patterning and fabrication

Sun. Mar 15, 2020 1:45 PM - 4:45 PM D215 (11-215)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.), Hiroaki Kawata(Osaka Pref. Univ.)

1:45 PM - 2:00 PM

[15p-D215-1] Exposure Characteristics of a Squared Optical Fiber Matrix Stacked with Linear Arrays

Toshiyuki Horiuchi1, Jun Watanabe1, Jun-ya Iwasaki1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)

Keywords:optical fiber matrix, matrix projection exposure, squared optical fiber

To develop a maskless exposure system for printing 2 dimensional code marks, light loss caused by simultaneous deforming of 10 optical fiber ends with a diameter of 0.5 mm was investigated. Influences on neighbored parts for projection exposure patterning were also investigated. The average light loss in the case of simultaneous deformations in squares became 60% or less of that in the case of one by one deformations. Fluctuation of pattern sizes printed by 1/10 reduction projection exposure was within ±3%. It was verified that the light lost through damaged side walls of squared parts did not almost affect the patterning results of neighbored parts.