[15p-D215-1~11] 7.3 Micro/Nano patterning and fabrication

[15p-D215-2] Soft X-ray Lithography using Laser Plasma Emission at 3 nm

〇Sho Amano¹ (1.Univ.of Hyogo, LASTI)

Keywords:soft X-ray lithography, laser plasma

We demonstrated the 3 nm soft X-ray lithography using the solid-argon laser-plasma source we developed. The soft X-ray at 3.37 nm from the source was reflected and focused on the PMMA samples using the ellipsoidal mirror coated with NiCr/V₂O₅ multi-layers and the Ni-mesh (2000/inch) contact mask was used. The soft X-ray intensity on the samples was estimated to be roughly 0.01 mJ/cm² and the etching depth was measured to be 130 nm with soft X-ray pulse exposure of 1000 shots.