The 67th JSAP Spring Meeting 2020

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[15p-D215-1~11] 7.3 Micro/Nano patterning and fabrication

Sun. Mar 15, 2020 1:45 PM - 4:45 PM D215 (11-215)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.), Hiroaki Kawata(Osaka Pref. Univ.)

4:30 PM - 4:45 PM

[15p-D215-11] Single-Pulse Laser Development of Metal-Deposited Imprint Resin Patterns

〇Yusuke Isawa1, Takahiro Nakamura1, Shunya Ito1, Masaru Nakagawa1 (1.IMRAM, Tohoku Univ.)

Keywords:UV-nanoimprint lithography, femtosecond pulsed laser, dry development

A lift-off process of a cured resin pattern is used to fabricate a metal pattern in UV-imprint lithography. In the process, it is necessary to introduce a sacrificial layer which is soluble in a solvent and to control the development time in response to the pattern density. In this study, we demonstrated a dry development of a metal layer deposited on a UV-imprinted resin pattern by a single shot of a femtosecond pulsed laser.