The 67th JSAP Spring Meeting 2020

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[15p-D311-1~8] 6.3 Oxide electronics

Sun. Mar 15, 2020 1:45 PM - 3:45 PM D311 (11-311)

Ryota Shimizu(Tokyo Tech)

3:15 PM - 3:30 PM

[15p-D311-7] Tensile strain dependence of electronic structures of LaNiO3 thin film by using hard X-ray photoemission spectroscopy

〇(P)Kohei Yamagami1, Keisuke Ikeda1, Yujun Zhang1,2, Akira Yasui3, Yasumasa Takagi3, Takayoshi Katase4, Toshio Kamiya4, Hiroki Wadati1,2 (1.ISSP Univ. of Tokyo, 2.Univ. of Hyogo, 3.JASRI, 4.Tokyo Inst. of Tech.)

Keywords:Nickelate, Thin film, Photoemission spectroscopy

The electronic states at the vicinity of Fermi level of strongly correlated electron nickelate thin films depend on the tensile strain of substrate, which leads to the changing of the transition temperature for electronic properties. Therefore, it is fundamentaly important to understand the electronic state. We report the hard X-ray photoemission spectroscopy for LaNiO3 thin films in order to invenstigate the tensile strain dependence of the electronic states, and successfully find that the electronic states near the Fermi level strongly depend on the tensile strain.