TAKESHI KADONO

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Speaker, Author, Co-Author

Fri. Sep 10, 2021 1:30 PM - 4:00 PM N203 (Oral)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal characterization, impurities and crystal defects

[10p-N203-1~9] 15.7 Crystal characterization, impurities and crystal defects

2:30 PM - 2:45 PM

[10p-N203-5] Characteristics of Multi-element Molecular Ion Implanted Epitaxial Silicon Wafers for 3D-Stacked CMOS Image Sensors (Ⅱ)
- Dark Current Reduction Mechanism of CH₂P Molecular Ion Implanted Epitaxial Wafers -

〇TAKESHI KADONO^1,2, Ryo Hirose¹, Ayumi Masada¹, Akihiro Suzuki¹, Koji Kobayashi¹, Ryosuke Okuyama¹, Yoshihiro Koga¹, Atsuhiko Fukuyama², Kazunari Kurita¹ (1.SUMCO CORPORATION, 2.Univ. of Miyazaki)