Taito Yoshie

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 9:00 AM - 11:30 AM N102 (Oral)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12a-N102-1~9] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:30 AM - 9:45 AM

△ [12a-N102-3] Behavior of active species in the cycle process modulated Ar/C₄F₈/SF₆ gases - 2

〇(M2)Taito Yoshie¹, Takayoshi Tsutsumi², Kenji Ishikawa², Masaru Hori² (1.Nagoya Univ. Eng., 2.Center for Low-temperature Plasma Sciences, Nagoya Univ.)