Charisse Cagomoc

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 9:00 AM - 11:30 AM N102 (Oral)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12a-N102-1~9] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:45 AM - 10:00 AM

▲ [12a-N102-4] Molecular Dynamics Study of Oxide-Nitride Etching by CF₃⁺ Ions

〇(D)Charisse Cagomoc¹, Michiro Isobe¹, Eric Hudson², Satoshi Hamaguchi¹ (1.Osaka University, 2.Lam Research Corp.)