Mana Otani

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Speaker, Author, Co-Author

Sun. Sep 12, 2021 9:45 AM - 12:00 PM N323 (Oral)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[12a-N323-1~8] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:45 AM - 10:00 AM

[12a-N323-1] Boron doping for silicon film deposition using boron trichloride gas

〇Mana Otani¹, Mitsuko Muroi¹, Hitoshi Habuka¹ (1.Yokohama National Univ.)