Symposium (Oral)
Symposium » Atomic layer processes for future device fabrication; Understanding surface reaction dynamics and its control
Sat. Sep 11, 2021 1:30 PM - 4:55 PM S301 (Oral)
Makoto Sekine(Nagoya Univ.), Jaeho Kim(AIST)
△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above
1:30 PM - 2:00 PM
〇Mitsunori Kurahashi1 (1.NIMS)
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2:00 PM - 2:30 PM
〇Toshiaki Kato1, Toshiro Kaneko1 (1.Tohoku Univ.)
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2:30 PM - 3:00 PM
〇Takao Sasagawa1 (1.Tokyo Tech.)
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3:15 PM - 3:45 PM
〇Kazuo Nojiri1 (1.Nanotech Research)
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3:45 PM - 4:15 PM
〇Masanobu Honda1, Takayuki Katsunuma1, Sho Kumakura1, Yoshihide Kihara1 (1.Tokyo Electron Miyagi)
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4:15 PM - 4:45 PM
〇Masanaga Fukasawa1 (1.Sony Semiconductor Solutions)
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4:45 PM - 4:55 PM
〇Kazunori Koga1,2 (1.Kyushu Univ., 2.NINS)
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