[10p-N302-1~15] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[10p-N302-1] (100) oriented crystallization of Silicon thin film by CW laser annealing on amorphous substrate for fabrication of high-mobility thin-film transistor

〇Satoshi Takayama¹, Sasaki Nobuo^1,2, Muhammad Arif¹, Uraoka Yukiharu¹ (1.NAIST, 2.Sasaki Consulting)

Keywords:laser crystallization