Study on Silicidation Reaction of Fe-NDs with SiH<sub>4</sub>

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Fri. Sep 10, 2021 1:30 PM - 5:45 PM N302 (Oral)

Wenchang Yeh(Shimane Univ.), Taizoh Sadoh(Kyushu Univ.)

4:00 PM - 4:15 PM

〇Hiroshi Furuhata¹, Katsunori Makihara¹, Ohta Akio¹, Noriyuki Taoka¹, Seiichi Miyazaki¹ (1.Nagoya Univ.)

Keywords:nanodots, iron silicide