3:15 PM - 3:30 PM
[10p-N302-7] Low temperature (~250°C) fabrication process for Ge spin MOSFET
Keywords:Germanium, Spin MOSFET, Low temperature process
Presentation information
Oral presentation
13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology
[10p-N302-1~15] 13.4 Si processing /Si based thin film / MEMS / Equipment technology
Fri. Sep 10, 2021 1:30 PM - 5:45 PM N302 (Oral)
Wenchang Yeh(Shimane Univ.), Taizoh Sadoh(Kyushu Univ.)