The 82nd JSAP Autumn Meeting 2021

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11a-N401-1~5] 7.3 Micro/Nano patterning and fabrication

Sat. Sep 11, 2021 9:00 AM - 10:15 AM N401 (Oral)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

9:45 AM - 10:00 AM

[11a-N401-4] Fabrication of freestanding two-stage through-electrode films using the transfer method

Atsuhiro Furuta1, Shin Hiwasa2, Jun Taniguchi1 (1.Tokyo Univ. of sci, 2.Autex Inc.)

Keywords:nano imprint, silver ink, through-electrode

In recent years, flexible devices such as sensors and solar cells fabricated using the printing method have been attracting attention. These devices can be manufactured at low cost, and because they are flexible, they can be easily bent and many functions can be mounted on a single substrate. In addition, in terms of device integration methods, through-hole electrodes are attracting attention for their superiority in terms of miniaturization and high density due to their three-dimensional structure. In this study, we investigated the fabrication method of freestanding through-electrode films.