[11a-N401-1~5] 7.3 Micro/Nano patterning and fabrication

[11a-N401-5] Fabrication of self-standing thin resin film with small through holes
by low temperature nanoimprint process

〇Hideki Tanabe¹, Hiroaki Kawata¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

Keywords:nanoimprint, self-standing thin resin film

A process for fabricating self-standing acrylic (PMMA) films with fine through holes is developed Both water-soluble polyvinyl alcohol (PVA) sacrificial films and thermal nanoimprint (TNIL) process are used. A PMMA film is stretched into PVA film due to PVA film softening for the conventional TNIL, and through holes cannot be obtained. In this report, the TLIL temperature was decreased below120 °C to prevent the PMMA film stretching. When the imprint temperature was 110 °C., the PMMA stretching was suppressed, and through holes were partially obtained. The process will be further improved.