Oral presentation

[11a-N401-1~5] 7.3 Micro/Nano patterning and fabrication

Sat. Sep 11, 2021 9:00 AM - 10:15 AM N401 (Oral)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

+Add all to schedule

9:00 AM - 9:15 AM

[11a-N401-1] Verification of Resist Patterning Using a Prototype Projection Exposure System Equipped with a Pair of Parabolic Mirrors

〇Toshiyuki Horiuchi¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

9:15 AM - 9:30 AM

[11a-N401-2] Surface Property Control for 193nm Immersion Resist by the Si material addition

〇Chen Tang¹, Atsushi Sekiguchi^2,3, Masaaki Yasuda³, Yoshihiko Hirai³ (1.Shanghai Sinyang Semi. Mater. Co., Ltd, 2.LTJ Co., Ltd, 3.Osaka Pref. Univ.)

9:30 AM - 9:45 AM

△ [11a-N401-3] Initial growth of calcium phosphate films on nano patterned polymer substrates

〇(M2)Naho Kaneko¹, Yuto Maeda¹, Tomoaki Oga¹, Tomohiro Hayashi¹, Evan Angelo Mondarte¹, Satoru Kaneko^2,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech, 2.KISTEC)

9:45 AM - 10:00 AM

[11a-N401-4] Fabrication of freestanding two-stage through-electrode films using the transfer method

〇Atsuhiro Furuta¹, Shin Hiwasa², Jun Taniguchi¹ (1.Tokyo Univ. of sci, 2.Autex Inc.)

10:00 AM - 10:15 AM

[11a-N401-5] Fabrication of self-standing thin resin film with small through holes
by low temperature nanoimprint process

〇Hideki Tanabe¹, Hiroaki Kawata¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11a-N401-1~5] 7.3 Micro/Nano patterning and fabrication

[11a-N401-1] Verification of Resist Patterning Using a Prototype Projection Exposure System Equipped with a Pair of Parabolic Mirrors

[11a-N401-2] Surface Property Control for 193nm Immersion Resist by the Si material addition

△ [11a-N401-3] Initial growth of calcium phosphate films on nano patterned polymer substrates

[11a-N401-4] Fabrication of freestanding two-stage through-electrode films using the transfer method

[11a-N401-5] Fabrication of self-standing thin resin film with small through holes
by low temperature nanoimprint process

Authenticate

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11a-N401-1~5] 7.3 Micro/Nano patterning and fabrication

[11a-N401-1] Verification of Resist Patterning Using a Prototype Projection Exposure System Equipped with a Pair of Parabolic Mirrors

[11a-N401-2] Surface Property Control for 193nm Immersion Resist by the Si material addition

△ [11a-N401-3] Initial growth of calcium phosphate films on nano patterned polymer substrates

[11a-N401-4] Fabrication of freestanding two-stage through-electrode films using the transfer method

[11a-N401-5] Fabrication of self-standing thin resin film with small through holesby low temperature nanoimprint process

Authenticate

[11a-N401-5] Fabrication of self-standing thin resin film with small through holes
by low temperature nanoimprint process