[11a-N401-1~5] 7.3 Micro/Nano patterning and fabrication

[11a-N401-1] Verification of Resist Patterning Using a Prototype Projection Exposure System Equipped with a Pair of Parabolic Mirrors

〇Toshiyuki Horiuchi¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

Keywords:Stereophonic projection exposure, parabolic mirror, exposure system

Stereophonic lithography using a pair of faced parabolic mirrors has been researched. In this report, prototype projection exposure system developed for investigating the new lithography method in detail is shown. The system is also expected to be used for obtaining data for developing a better and realistic exposure system. Structures, components of the prototype system and their sizes are explained. Using the system, 200-µm line-and-space patterns are successfully printed. It was verified that lithographic patterning in resist was prospective using the parabolic mirror optics.