[11a-S201-1~6] Thin film / surface physics research trends and future prospects -The 50th anniversary of Thin film and surface physics division-

[11a-S201-5] Progress for 50 years and hereafter of surface analysis using synchrotron radiation:
Development of X-ray photoelectron spectroscopy

〇Yuji Takakuwa¹ (1.Tohoku Univ.)

Keywords:synchrotron radiation, X-ray photoelectron spectroscopy, surface analysis

To begin with, the development of the synchrotron radiation facilities in Japan and their applications are introduced. Among surface analysis methods using synchrotron radiation, X-ray photoelectron spectroscopy attracted much attention from 1970' and the number of XPS users shows a continuous increase from 1980' to the present, resulting in the rapid development of XPS-related technologies, especially since 1990'. Hereafter, the key words are "spin and momentum resolved", "microscopic observation", near ambient pressure XPS", and "Hard X-ray photoelectron spectroscopy". Regarding NAP-XPS and HAXPES, the development history, issues, and prospect are described concretely.