[11p-S301-1~7] Atomic layer processes for future device fabrication; Understanding surface reaction dynamics and its control

[11p-S301-1] Analysis of Surface Reactions Induced by Excited Atom and Aligned O₂ beam

〇Mitsunori Kurahashi¹ (1.NIMS)

Keywords:surface reaction, excited atom

Surface oxidation process, which has been studied for understanding the mechanism of catalytic reactions and corrosion processes, is becoming important as an elementary process of the etching of ferromagnetic metals (Ni, Co, etc.). On the other hand, there has been an interest for the potential use of a slow metastable atom beam for the low-damage sputtering required for atomic layer processes. Studies on alignment-controlled O2 chemisorption on Ni, Co thin films and metastable atom induced surface processes will be presented.