[12p-N102-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [12p-N102-10] Formation of carbon nitride films by nitrogen plasma enhanced chemical transport technique

〇Hiromichi Nakatsuka¹, Rei Tanaka¹, Hiroaki Kakiuchi¹, Hiromasa Ohmi¹ (1.Osaka Univ.)

Keywords:plasma, carbon nitride film, chemical transport