[12p-N102-1~15] 8.2 プラズマ成膜・エッチング・表面処理

▼ [12p-N102-13] High conductive carbon film deposition by electron cyclotron resonance (ECR) plasma

〇Hansin BAE¹、Hamaguchi Ikumi¹、Kensuke Sasai²、Haruka Suzuki^1,2、Hirotaka Toyoda^1,2,3 (1.Nagoya Univ.、2.Nagoya Univ. cLPS、3.NIFS)

キーワード：High conductive carbon film deposition, PECVD, ECR plasma