Effect of bias supply during synthesis of AlOx and TiO<em><sub>x</sub></em> thin films by a mist chemical vapor deposition

Kojun Yokoyama; Arifuzzaman Rajib; Abdul Kuddus; Tomohiro Shida; Keiji Ueno; Hajime Shirai

Presentation information

Oral presentation

21 Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[13a-S201-1~9] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Mon. Sep 13, 2021 9:00 AM - 11:30 AM S201 (Oral)

Takumi Ikenoue(Kyoto Univ.), Kohei SHIMA(Tohoku Univ.)

11:00 AM - 11:15 AM

[13a-S201-8] Effect of bias supply during synthesis of AlOx and TiO_x thin films by a mist chemical vapor deposition

〇(M1)Kojun Yokoyama¹, Arifuzzaman Rajib¹, Abdul Kuddus¹, Tomohiro Shida¹, Keiji Ueno¹, Hajime Shirai¹ (1.Saitama Univ.)

Keywords:Mist-CVD, Mesh bias, Mist particle, MIS-FET,

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Presentation information

[13a-S201-1~9] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[13a-S201-8] Effect of bias supply during synthesis of AlOx and TiOx thin films by a mist chemical vapor deposition

[13a-S201-8] Effect of bias supply during synthesis of AlOx and TiO_x thin films by a mist chemical vapor deposition