[13p-S301-1~15] 6.2 Carbon-based thin films

△ [13p-S301-6] High-Rate Deposition of DLC Films Using Plasma Jet CVD Method by Applying Substrate-Pulse-Bias Voltage

〇Hikaru Ohhra¹, Takahiro Bando¹, Hirofumi Takikawa¹, Toru Harigai¹, Hidenobu Gonda², Shinsuke Kunitsugu³ (1.Toyohashi Univ. Technol., 2.OSG Coating Service Co., Ltd., 3.Ind. Technol. Cent. Okayama Pref.)

Keywords:DLC, Plasma Jet CVD method, High-Rate Deposition

Diamond-like carbon (DLC) film, which is a hard amorphous carbon film, is used as a functional protective film for cutting tools because of its excellent mechanical properties. In this study, we investigated the effect on the DLC film when a DC pulse voltage was applied to the substrate stage in the film formation process using a plasma jet. The higher the substrate pulse bias voltage, the higher the deposition rate, and the maximum deposition rate of 2200 nm / min was obtained at the substrate pulse bias voltage of -500 V.