Hiromichi Nakatsuka

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Speaker, Author, Co-Author

Thu. Mar 18, 2021 9:00 AM - 12:00 PM Z17 (Z17)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-Z17-1~11] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:45 AM - 11:00 AM

△ [18a-Z17-7] Characterization of the high-rate prepared fluorocarbon films by solid-source aided plasma chemical vapor deposition technique

〇Hiromichi Nakatsuka¹, Rei Tanaka¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹, Hiromasa Ohmi¹ (1.Osaka Univ.)