Tsuyoshi Otani

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Speaker, Author, Co-Author

Thu. Mar 18, 2021 9:00 AM - 12:00 PM Z17 (Z17)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-Z17-1~11] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:45 AM - 12:00 PM

[18a-Z17-11] The Characteristics of SiO2 Thin Films Coated with HC-PECVD

〇Tsuyoshi Otani¹, Hidehiko Yoda² (1.AIOT, 2.Utsunomiya Univ.)