Taishi Nojima

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Speaker, Author, Co-Author

Thu. Mar 18, 2021 1:30 PM - 5:15 PM Z24 (Z24)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18p-Z24-1~14] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

2:30 PM - 2:45 PM

[18p-Z24-5] Study on instantaneous heating during deposition of amorphous silicon by plasma CVD

〇(M1)Taishi Nojima¹, Takuma Sato¹, Hiroaki Hanafusa¹, Seiitirou Higashi¹ (1.Hiroshima Univ.)