Koichi Ishii

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Speaker, Author, Co-Author

Fri. Mar 19, 2021 10:00 AM - 10:50 AM P04 (Poster)

Poster presentation
| 8 Plasma Electronics
| 8 Plasma Electronics(Poster)

[19a-P04-1~9] 8 Plasma Electronics(Poster)

10:00 AM - 10:50 AM

[19a-P04-5] Measurement of Gas Flow Rate Dependence of Incident Radical and Ion on the Substrate in RF Low-Pressure Tetramethylsilane Plasmas

〇(M1C)Koichi Ishii¹, Shun Suzuki¹, Akinori Oda¹, Yoshiaki Watanabe², Takayuki Ohta³, Hiroyuki Kousaka⁴ (1.Chiba Inst., 2.Innovation Science Co. Ltd., 3.Meijo Univ., 4.Gifu Univ.)

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