Ryosuke Ochiai

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Speaker, Author, Co-Author

Fri. Mar 19, 2021 10:00 AM - 10:50 AM P04 (Poster)

Poster presentation
| 8 Plasma Electronics
| 8 Plasma Electronics(Poster)

[19a-P04-1~9] 8 Plasma Electronics(Poster)

10:00 AM - 10:50 AM

[19a-P04-9] Development of a wafer surface charge suppression method by low frequency voltage for atomic level profile control in plasma etching

〇Ryosuke Ochiai¹, Mori Isao¹, Tanaka Motohiro¹ (1.Hitachi High-Tech)