Shuichi Noda

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Speaker, Author, Co-Author

Fri. Mar 19, 2021 9:00 AM - 11:45 AM Z24 (Z24)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19a-Z24-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:15 AM - 9:30 AM

[19a-Z24-2] AlN Film Characteristics Deposited by Minimal Fab Reactive Sputtering Tool (2)

〇Shuichi Noda¹, Yuuki Yabuta³, Naoko Yamamoto³, Ryuichiro Kamei³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.Seinan-kogyo)

Fri. Mar 19, 2021 1:30 PM - 4:15 PM Z24 (Z24)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19p-Z24-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

3:30 PM - 3:45 PM

[19p-Z24-8] Characterization of SN ratio and other performances in MINIMAL FAB TXRF Tool (TXRF Tester)

〇Shuichi Noda¹, Hiroshige Kogayu², Wataru Sakai³, Jun Hirose³, Tatsuya Hayashi³, Kana Onishi³, Hiroshi Nishizato³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.HORIBA STEC)

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