Hiroyuki Tanaka

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Speaker, Author, Co-Author

Fri. Mar 19, 2021 9:00 AM - 11:45 AM Z24 (Z24)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19a-Z24-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:45 AM - 10:00 AM

[19a-Z24-4] A Study of dry etching process of Silicon oxide film using Minimal Fab

〇Hiroyuki Tanaka¹, Yoshiyuki Nozawa^2,3, Toshihiro Hayami^2,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.SPPT)

10:45 AM - 11:00 AM

[19a-Z24-7] A Study of dependence of deep Bosch etching process on mask material

〇Hiroyuki Tanaka¹, Yoshiyuki Nozawa^2,3, Toshihiro Hayami^2,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.SPPT)