[18a-Z16-1~8] 7.3 Micro/Nano patterning and fabrication

[18a-Z16-7] Optimization of BILM for 3-dimensional photolithography

〇(B)Tomoaki Osumi¹, Masaaki Yasuda¹, Masaru Sasago¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

Keywords:photolithography, 3 dimension, single eposure

For the expected built-in lens mask that realizes three-dimensional photolithography by simple exposure with one mask, the image intensity in the entire space is compared with the light intensity of the target three-dimensional structure, and optimize the mask pattern by arranging seeds with newly adjusted complex amplitudes so as to cancel out.