[18a-Z17-1~11] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-Z17-2] Effects of the substrate and source position on the chemical bonding states of the film deposited with benzene plasma

〇Masanori Shinohara¹, Tatsuo Nakai¹, Ryo Sasamoto¹, Satoshi Tanaka², Takashi Matsumoto² (1.Fukuoka Univ., 2.TTS)

Keywords:benzene plasma, infrared spectroscopy, source supply-position

Effects of the source position on the deposition of amorphous carbon film using benzene plasma are investigated. The sp³-hydrocarbon species are formed in the deposited film when benzene molecules are supplied from plasma source, as well as when they are supplied from the vicinity of the substrate. On the other hand, the benzene rings remain in the depsosited film only in the latter case.