[18p-Z17-1~20] 8.1 Plasma production and diagnostics

[18p-Z17-14] Ion composition analysis of Deep Oscillation Magnetron Sputtering (DOMS) using a reflectron time-of-flight mass spectrometer

〇Yuki Nakagomi¹, Hiroshi Nishida¹, Nobuo Nishimiya¹, Masaomi Sanekata¹, Hiroaki Yamamoto², Naoyuki Hirata², Masahide Tona², Keizo Tsukamoto², Kiyokazu Fuke³, Keijiro Ohshimo⁴, Fuminori Misaizu⁴ (1.Tokyo Polytechinic Univ., 2.Ayabo Corp, 3.Toyota Phys. & Chem. Res. Inst., 4.Tohoku Univ.)

Keywords:sputtering, magunetoron supattering, time of flight mass spectrometry

High-power impulse magnetron sputtering (HiPIMS) which can inject high power and modulated pulse magnetron sputtering (MPPMS) which has excellent arching suppression performance were developed as a new ionized physical vapor deposition (I-PVD). Recently, deep oscillation magnetron sputtering (DOMS), which uses a comb-shaped discharge waveform, is attracting attention mainly in DLC film formation as a next-generation MPPMS that avoids arching with maintaining power equivalent to HiPIMS. Currently, researchs on DOMS are mainly focused on film formation characteristics.Therefore, elucidation of the sputtering process in DOMS is still in the early stages of research. In this study, the ion composition of DOMS plasma using time-of-flight mass analysis (TOFMS) and the temporal formation profiles of each ionized species were investigated. At presentation, we will report on the relationship between comb-shaped discharge and the sputtering process of DOMS.