In-situ measurement of Deposited Film Thickness and Electron density with Double Curling Probes

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

Thu. Mar 18, 2021 1:30 PM - 7:00 PM Z17 (Z17)

Hiroshi Akatsuka(Tokyo Tech), Kentaro Tomita(Hokkaido Univ.), Manabu Tanaka(Kyushu Univ.)

3:00 PM - 3:15 PM

〇(B)Shota Kato¹, Daisuke Ogawa¹, Keiji Nakamura¹ (1.Chubu Univ.)

Keywords:curling probe, in-situ measurements, deposited film