[19a-P01-1~5] 7 Beam Technology and Nanofabrication(Poster)

[19a-P01-2] Imprint temperature suppression for thermal nanoimprint lithography

〇Hideki Tanabe¹, Shingo Shimizu¹, Hiroaki Kawata¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

Keywords:thermal nanoimprint

In thermal nanoimprint (TNIL) process, a relatively high temperature about 150 °C is often required for the imprint press. However, it is necessary to decrease the press temperature for a low heat resistance substrate. In this report, the temperature of the prebake followed to the spin coating was reduced. Then, the solvent remains in the thin resin film, and the hardness of the resin film can be reduced. As a result, it has become possible to produce good patterns for acrylic (PMMA) and polystyrene (PS) TNIL at the imprint temperature of 100 ° C.