[19a-Z24-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19a-Z24-3] Deposition of AlN thin film using minimal RF-sputtering machine

〇Masaya Hotta¹, Hiroshi Nishizato¹, Haruki Toonoe², Ikunari Shiba², Takuya Maeda³, Yuki Odo³, Satoshi Fujii³ (1.HORIBA STEC, 2.YOKOGAWA S.S., 3.N.I.T. Okinawa call.)

Keywords:minimalfab, sputtering, aluminum nitride