[19p-Z24-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19p-Z24-1] Strategy of Device Development of Minimal Fab and Utilization of TCAD Technology

〇Takeshi Hamamoto¹, Kazuhiro Koga¹, Hiroshige Kogayu¹, Junichi Hattori^2,3, Koichi Fukuda^2,3, Khumpuang Sommawan^1,2, Shiro Hara^1,2 (1.MINIMAL, 2.AIST, 3.AIDL)

Keywords:semiconductor, device

Minimal fab is a production system whose primary target is high variety and small quantity production. In this minimal fab, the verification of MEMS, CMOS and OPamp using it, and 1,000 Gate level integrated circuits has been completed. In this presentation, we will present the device candidates for future minimal fabs, their advantages and development items, and discuss the preparation status of TCAD technology that has been introduced from the viewpoint of improving device design efficiency.