Tetsuya Goto

→ Search for Tetsuya Goto in Google Scholar

Speaker, Author, Co-Author

Tue. Sep 20, 2022 1:00 PM - 4:30 PM A406 (A406)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[20p-A406-1~13] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

3:00 PM - 3:15 PM

[20p-A406-8] Evaluation of Poly-Si Gate Electrode CVD Using Trisilane for Minimal Fab System

〇Tetsuya Goto¹, Seiji Kobayashi², Thai Quoc Cuong², Yuki Yabuta³, Shigetoshi Sugawa¹, Shiro Hara^4,5 (1.NICHe, Tohoku Univ., 2.Kotec, 3.Seinan, 4.AIST, 5.Minimal)

▲