1:15 PM - 1:30 PM
[20p-A406-2] Development of spin droplet cleaning technology that enables wafer backside cleaning(Ⅱ)
〇Kazumasa Nemoto1, Takashi Yajima1, Noriko Miura2, Kazushige Sato2, Sommawan Khumpuang1,2, Shiro Hara1,2 (1.AIST, 2.Minimal Fab)
Tue. Sep 20, 2022 1:00 PM - 4:30 PM A406 (A406)
1:15 PM - 1:30 PM
〇Kazumasa Nemoto1, Takashi Yajima1, Noriko Miura2, Kazushige Sato2, Sommawan Khumpuang1,2, Shiro Hara1,2 (1.AIST, 2.Minimal Fab)