Kazumasa Nemoto

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Speaker, Author, Co-Author

Tue. Sep 20, 2022 1:00 PM - 4:30 PM A406 (A406)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[20p-A406-1~13] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

1:15 PM - 1:30 PM

[20p-A406-2] Development of spin droplet cleaning technology that enables wafer backside cleaning(Ⅱ)

〇Kazumasa Nemoto¹, Takashi Yajima¹, Noriko Miura², Kazushige Sato², Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.Minimal Fab)