Shuichi Noda

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Speaker, Author, Co-Author

Tue. Sep 20, 2022 1:00 PM - 4:30 PM A406 (A406)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[20p-A406-1~13] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

2:00 PM - 2:15 PM

[20p-A406-5] Characteristics of AlN Film Deposited by Minimal Fab Reactive Sputtering Tool (3)

〇Shuichi Noda¹, Yuuki Yabuta³, Naoko Yamamoto³, Ryuichiro Kamei³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.Seinan-Kogyo)