JoongWon Shin

→ Search for JoongWon Shin in Google Scholar

Speaker, Author, Co-Author

Thu. Sep 22, 2022 1:30 PM - 6:00 PM A307 (A307)

Oral presentation
| CS Code-sharing session
| 【CS.7】 Code-sharing Session of 6.1 & 13.3 & 13.5

[22p-A307-1~17] CS.7 Code-sharing Session of 6.1 & 13.3 & 13.5

4:00 PM - 4:15 PM

▼ [22p-A307-10] Investigation of the etching process for Pt gate electrode on the ferroelectric property of 5 nm thick nondoped HfO₂ thin films

〇(DC)JoongWon Shin¹, Masakazu Tanuma¹, Shun-ichiro Ohmi¹ (1.Tokyo Inst. of Technol.)