Miyuki Nishimura

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Speaker, Author, Co-Author

Thu. Sep 22, 2022 1:00 PM - 5:00 PM A406 (A406)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[22p-A406-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:15 PM - 4:30 PM

△ [22p-A406-13] Deposition of rutile titanium oxide thin film using high power pulsed magnetron sputtering

〇(M1C)Miyuki Nishimura¹, Takayuki Ohta¹ (1.Meijo Univ.)